Quantum confined Stark effect due to built-in internal polarization fields in (Al,Ga)N/GaN quantum wells. - Centre de Recherche sur l'Hétéro-Epitaxie et ses Applications Accéder directement au contenu
Article Dans Une Revue Physical Review B: Condensed Matter and Materials Physics (1998-2015) Année : 1998

Quantum confined Stark effect due to built-in internal polarization fields in (Al,Ga)N/GaN quantum wells.

Résumé

(Al,Ga)N/GaN quantum wells have been studied by temperature-dependent luminescence and reflectivity. The samples were grown by molecular beam epitaxy on (0001) sapphire substrates, and well widths were varied from 3 to 15 monolayers (ML’s) with a 2-ML increment, thus providing a reliable data set for the study of the well width dependence of transition energies. The latter shows a strong quantum confined Stark effect for wide wells, and an internal electric-field strength of 450 kV/cm is deduced. X-ray diffraction performed on the same samples shows that the GaN layers are nearly unstrained, whereas the (Al,Ga)N barriers are pseudomorphically strained on GaN. We conclude that the origin of the electric field is predominently due to spontaneous polarization effects rather than a piezoelectric effect in the well material.
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hal-01291688 , version 1 (21-03-2016)

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Mathieu Leroux, Nicolas Grandjean, M. Laügt, Jean Massies, Bernard Gil, et al.. Quantum confined Stark effect due to built-in internal polarization fields in (Al,Ga)N/GaN quantum wells.. Physical Review B: Condensed Matter and Materials Physics (1998-2015), 1998, 58 (20), pp.R13371. ⟨10.1103/PhysRevB.58.R13371⟩. ⟨hal-01291688⟩
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