Follow the Clermont Auvergne HAL Portal publications on Twitter
Need help ?
Consult or download our document (french) :
For any information and assistance with the deposit of publications in HAL Clermont Auvergne, or for any request for training, contact us :
- Jessica LEYRIT hal.bu@uca.fr
Administrator HAL UCA - Digital Library - Manuela ASSUNÇÃO de CARVALHO hal.bu@uca.fr
Administrator HAL UCA - Digital Library - Vincent AUGUSTIN vincent.augustin@uca.fr
Correspondent HAL Sciences - Cézeaux Library
Open Access
31 %
Documents with full text
988
Bibliographical references
3 121
Breakdown by type of document
Breakdown by domain
Publishers Policy
Latest deposits
-
-
-
-
Jean-François Ghiglione, Valérie Barbe, Stéphane Bruzaud, Gaëtan Burgaud, Jérôme Cachot, et al.. Mission Tara Microplastics: a holistic set of protocols and data resources for the field investigation of plastic pollution along the land-sea continuum in Europe. Environmental Science and Pollution Research, 2023, ⟨10.1007/s11356-023-26883-9⟩. ⟨hal-04302147⟩
-
Peng Cheng, Mohamed Sarakha, Christine Mousty, Pierre Bonnet, Gilles Mailhot. Tetra-n-butylammonium decatungstate supported on Fe 3 O 4 nanoparticles: a novel nano-catalyst for green synthesis of nitroso compounds. Catalysis Science & Technology, 2023, 13 (4), pp.1000-1008. ⟨10.1039/d2cy01862d⟩. ⟨hal-04301268⟩
-
Florent Rossi, Raphaëlle Péguilhan, Nathalie Turgeon, Marc Veillette, Jean-Luc Baray, et al.. Quantification of antibiotic resistance genes (ARGs) in clouds at a mountain site (puy de Dôme, central France). Science of the Total Environment, 2023, 865, pp.161264. ⟨10.1016/j.scitotenv.2022.161264⟩. ⟨hal-04300300⟩
-
-
-
Carolina Machado Terzi, Everton Henrique dos Santos, Charles Carvalho, Vanessa Prevot, Fernando Wypych, et al.. MgAl and ZnAl layered double hydroxides modified with molybdate and tungstate anions as catalysts for oxidation of cyclohexane. Catalysis Today, 2023, 422, pp.114221. ⟨10.1016/j.cattod.2023.114221⟩. ⟨hal-04298957⟩
-
A Farhaoui, A Bousquet, Rafik Smaali, A Moreau, E Centeno, et al.. Reactive gas pulsing sputtering process, a promising technique to elaborate silicon oxynitride multilayer nanometric antireflective coatings. Journal of Physics D: Applied Physics, 2016, 50, ⟨10.1088/1361-6463/50/1/015306⟩. ⟨hal-04287139⟩
Consultation and quotation
The intellectual property of the deposited documents remains entirely that of the authors. HAL users are therefore subject to the usual rules of proper use, including respect for original works and the prohibition of intellectual plunder. The documents may be used for teaching and research purposes; on the other hand, users undertake to indicate the complete reference of the document, indicated on the HAL notice thereof.
Legal notice
The open archives of the University of Clermont Auvergne were carried out with the help of the Center for Direct Scientific Communication, theUniversité Clermont Auvergne, and the Digital Library of the Clermont Auvergne University Library.