Preferential sublimation along threading dislocations in InGaN/GaN single quantum well for improved photoluminescence - Laboratoire Charles Coulomb (L2C) Access content directly
Journal Articles Journal of Applied Physics Year : 2022

Preferential sublimation along threading dislocations in InGaN/GaN single quantum well for improved photoluminescence

Abstract

InGaN/GaN single quantum wells were grown by molecular beam epitaxy on the silicon substrate onto thin AlN and GaN buffer layers. The InGaN/GaN structure is porosified using a combination of Si x N y nanomasking and sublimation and compared with a non-porous reference. The photoluminescence efficiency at room temperature of the porosified sample is improved by a factor reaching 40 compared with the reference sample. Plan-view and cross-sectional transmission electron microscopy images reveal that the remaining material is free of dislocation cores. The regions around dislocations are, thus, preferentially sublimated. This explains the strong photoluminescence improvement of nanoporous InGaN/GaN samples.
Fichier principal
Vignette du fichier
PorousGaNJAP HALpr22nov22.pdf (1.23 Mo) Télécharger le fichier
Origin : Files produced by the author(s)

Dates and versions

hal-03865257 , version 1 (22-11-2022)

Identifiers

Cite

B. Damilano, Stephane Vezian, M.P. Chauvat, Pierre Ruterana, Nuño Amador-Méndez, et al.. Preferential sublimation along threading dislocations in InGaN/GaN single quantum well for improved photoluminescence. Journal of Applied Physics, 2022, 132 (3), pp.035302. ⟨10.1063/5.0089892⟩. ⟨hal-03865257⟩
90 View
56 Download

Altmetric

Share

Gmail Facebook Twitter LinkedIn More