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Article Dans Une Revue European Physical Journal: Applied Physics Année : 2003

Physico-chemical environment of Al impurity atoms in amorphous silica

Résumé

The physico-chemical environment around the aluminum impurity atoms in commercial Herasil silica is studied by electron-induced X-ray emission spectroscopy. Despite the low concentration of aluminum and the charging effect occurring upon electron irradiation , we have been able to characterize the environment of the Al atoms. We show that the Al atoms are in an octahedral environment , i. e. surrounded by 6 oxygen atoms. The presence of Al clusters , whose metallic character would make them candidates to be ultraviolet absorption centers , is ruled out.
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Dates et versions

hal-01346820 , version 1 (19-07-2016)

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Ph Jonnard, J.-P Morreeuw, H Bercegol. Physico-chemical environment of Al impurity atoms in amorphous silica. European Physical Journal: Applied Physics, 2003, 21, pp.147-149. ⟨10.1051/epjap:2002109⟩. ⟨hal-01346820⟩
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