Interdiffusion behaviors observation in TiN/ZrO N bilayer by XAS and ToF-SIMS - Laboratoire de Chimie Physique-Matière et Rayonnement Accéder directement au contenu
Article Dans Une Revue Applied Surface Science Année : 2020

Interdiffusion behaviors observation in TiN/ZrO N bilayer by XAS and ToF-SIMS

Résumé

Interface behavior plays an important role in multilayer structure. The deep understanding of interface diffusion and reaction is necessary to improve the performance of device with multilayer structure. In the present work, we perform a detailed systematic study on interdiffusion and interaction between the TiN and ZrO x N y layers in the TiN/ZrO x N y bilayer system. A series of TiN/ZrO x N y bilayers with reverse deposition orders or with varied composition have been prepared by radio-frequency reactive magnetron sputtering. Synchrotron radiation x-ray absorption spectroscopy (XAS) and time of flight secondary ion mass spectrometry (ToF-SIMS) are both used to understand well interface diffusion behavior. The XAS results indicate that interaction and interdiffusion extent between TiN and ZrO 2
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Dates et versions

hal-02882706 , version 1 (27-06-2020)

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Yanyan Yuan, Philippe Jonnard, Karine Le Guen, Bingye Zhang, Anouk Galtayries, et al.. Interdiffusion behaviors observation in TiN/ZrO N bilayer by XAS and ToF-SIMS. Applied Surface Science, 2020, 528, pp.146968. ⟨10.1016/j.apsusc.2020.146968⟩. ⟨hal-02882706⟩
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