Plasma-Enhanced Chemical Vapor Deposition in a Transmission Electron Microscope? - Archive ouverte HAL Access content directly
Journal Articles Microscopy and Microanalysis Year : 2021

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hal-03822374 , version 1 (20-10-2022)

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Jean-Luc Maurice, Pavel Bulkin, Éric Ngo, Weixi Wang, Pere Roca I Cabarrocas, et al.. Plasma-Enhanced Chemical Vapor Deposition in a Transmission Electron Microscope?. Microscopy and Microanalysis, 2021, 27 (S2), pp.25-26. ⟨10.1017/S143192762101312X⟩. ⟨hal-03822374⟩
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