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Article Dans Une Revue Thin Solid Films Année : 2013

Deformation modes of nanostructured thin film under controlled biaxial deformation

Résumé

This paper reports on the mechanical behaviour of nanostructured W/Cu thin films deposited on Kapton® under controlled biaxial loadings thanks to a biaxial testing device developed on DiffAbs beamline at SOLEIL synchrotron (Saint-Aubin, France). In situ tensile tests were carried out combining 2D synchrotron x-ray diffraction (XRD) and digital-image correlation (DIC) techniques. First, the elastic behaviour of the composite metallic film-polymeric substrate was investigated under equi-biaxial and non-equi-biaxial loading conditions. The results show that the strain measurements (in the crystalline film by XRD and the substrate by DIC) match to within 10^-4. This result demonstrates the full transmission of strains in the elastic domain through the film-substrate interface and thus a good adhesion of the thin film to the substrate. The second part of the paper deals with higher strains response under equi-biaxial tensile tests. The elastic limit of the nanostructured W/Cu thin films was determined at the bifurcation point between strains obtained by XRD and DIC. Deformation mechanisms such as strain localisation and film fragmentation are proposed.
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Dates et versions

hal-00947392 , version 1 (20-02-2014)

Identifiants

Citer

Soundes Djaziri, Damien Faurie, Eric Le Bourhis, Philippe Goudeau, Pierre-Olivier Renault, et al.. Deformation modes of nanostructured thin film under controlled biaxial deformation. Thin Solid Films, 2013, 530, pp.30-34. ⟨10.1016/j.tsf.2012.05.051⟩. ⟨hal-00947392⟩
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