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Communication Dans Un Congrès Année : 2009

The ways to deposit amorphous or nanocrystalline material from a vapor phase

Résumé

This paper deals with Chemical Vapor Deposition (CVD) and ALD (Atomic Layer Deposition) processes which lead to materials elaborated from a gaseous phase. These processes constitute an important technology in many applications fields such as microelectronics, energy, protective coating industry …. Once the target material is identified, to achieve specific film properties, efforts should be focused on the obtention of a particular film microstucture. The microstructure of the deposited layer is determined by the roles played by the growth phenomena and as a consequence, is strongly dependent on the choice of the process parameters (nature of chemical precursor, nature and structure of the substrate on which the material has to be deposited, temperature, total pressure, nature and partial pressures of the gaseous species).

Domaines

Matériaux
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Dates et versions

hal-00488887 , version 1 (25-11-2020)

Licence

Paternité

Identifiants

  • HAL Id : hal-00488887 , version 1

Citer

E. Blanquet, A. Mantoux, M. Pons. The ways to deposit amorphous or nanocrystalline material from a vapor phase. 11th International Conference on Advanced Materials (ICAM), Sep 2009, Rio de Janeiro, Brazil. ⟨hal-00488887⟩

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