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Communication Dans Un Congrès Année : 2006

Profile control and sidewall modifications of narrow porous ULK trenches after plasma etching and pore sealing treatments

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hal-00400479 , version 1 (30-06-2009)

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  • HAL Id : hal-00400479 , version 1

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Maxime Darnon, Thierry Chevolleau, D. Eon, Fanny Bailly, Bernard Pélissier, et al.. Profile control and sidewall modifications of narrow porous ULK trenches after plasma etching and pore sealing treatments. 53rd International AVS Symposium, 2006, San Francisco, United States. ⟨hal-00400479⟩
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