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Communication Dans Un Congrès Année : 2005

Comparison Between Metallic and Inorganic Hard Masks Used for Advanced Porous Low-k Patterning

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hal-00461955 , version 1 (08-03-2010)

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  • HAL Id : hal-00461955 , version 1

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Maxime Darnon, T. Chevolleau, N. Posseme, T. David, L. Vallier, et al.. Comparison Between Metallic and Inorganic Hard Masks Used for Advanced Porous Low-k Patterning. 15th International Colloquium on Plasma Processes, 2005, Autrans, France. ⟨hal-00461955⟩
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