Tailoring the Properties of Atomic Layer Deposited Nickel and Nickel Carbide Thin Films via Chain-Length Control of the Alcohol Reducing Agents - CNRS - Centre national de la recherche scientifique Accéder directement au contenu
Article Dans Une Revue Journal of Physical Chemistry C Année : 2014

Tailoring the Properties of Atomic Layer Deposited Nickel and Nickel Carbide Thin Films via Chain-Length Control of the Alcohol Reducing Agents

Résumé

Atomic layer deposition (ALD) of nickel and nickel carbide is reported starting from nickel acetylacetonate and a primary alcohol. The sequential reactions of both reactants with the adsorbed species are shown to be self-limited. Use of propanol or ethanol as reducing agents yields the formation of the technologically relevant carbon-Ni3C thin films, whereas the carbon content with use of methanol is less than 5 atom %. These metallic nickel thin films are electrically conductive and feature a soft ferromagnetic behavior. The thermally stable cubic lattice of nickel was grown at 300 degrees C with methanol as a reducing agent while the metastable hexagonal structure was obtained at lower temperatures. The morphology and the structure of the films were investigated with use of scanning electron microscopy and X-ray diffraction. The films are nanocrystalline featuring an average crystallite size of similar to 10 nm. Hydrogen-free ALD of nickel is particularly appealing for the deposition of (i) conformal coatings on hydrogen-sensitive substrates such as highly reducible oxides and metals with high capacity to form hydrides and (ii) 3D nanomaterials with high aspect ratio.

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Matériaux
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Dates et versions

hal-01289113 , version 1 (16-03-2016)

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Citer

Mouhamadou Sarr, Naoufal Bahlawane, Didier Arl, M. Dossot, Edward Mcrae, et al.. Tailoring the Properties of Atomic Layer Deposited Nickel and Nickel Carbide Thin Films via Chain-Length Control of the Alcohol Reducing Agents. Journal of Physical Chemistry C, 2014, 118 (40), pp.23385-23392. ⟨10.1021/jp5068318⟩. ⟨hal-01289113⟩
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