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Article Dans Une Revue Journal of Applied Physics Année : 2015

Structural and optical study of Ce segregation in Ce-doped SiO 1.5 thin films

Georges Beainy
Mathieu Stoffel
M. Vergnat
Hervé Rinnert
Celia Castro
Philippe Pareige
Etienne Talbot

Résumé

Cerium doped SiO 1.5 thin films fabricated by evaporation and containing silicon nanocrystals were investigated by atom probe tomography. The effect of post-growth annealing treatment has been systematically studied to correlate the structural properties obtained by atom probe tomography to the optical properties measured by photoluminescence spectroscopy. The atom probe results demonstrated the formation of Ce-Si rich clusters upon annealing at 900 C which leads to a drastic decrease of the Ce-related luminescence. At 1100 C, pure Si nanocrystals and optically active cerium silicate compounds are formed. Consequently, the Ce-related luminescence is found to reappear at this temperature while no Si-nanocrystal related luminescence is observed for films containing more than 3% Ce. V C 2015 AIP Publishing LLC. [http://dx.
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Dates et versions

hal-01633488 , version 1 (28-02-2019)

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Citer

Georges Beainy, Jennifer Weimmerskirch-Aubatin, Mathieu Stoffel, M. Vergnat, Hervé Rinnert, et al.. Structural and optical study of Ce segregation in Ce-doped SiO 1.5 thin films. Journal of Applied Physics, 2015, 118 (23), pp.234308. ⟨10.1063/1.4938061⟩. ⟨hal-01633488⟩
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