Correction: Fabrication of poly-crystalline Si-based Mie resonators via amorphous Si on SiO2 dewetting - CNRS - Centre national de la recherche scientifique Accéder directement au contenu
Article Dans Une Revue Nanoscale Année : 2016

Correction: Fabrication of poly-crystalline Si-based Mie resonators via amorphous Si on SiO2 dewetting

Résumé

Correction for ‘Fabrication of poly-crystalline Si-based Mie resonators via amorphous Si on SiO2 dewetting’ by Meher Naffouti, et al., Nanoscale, 2016, 8, 2844–2849.

Dates et versions

hal-01811397 , version 1 (08-06-2018)

Identifiants

Citer

Meher Naffouti, Thomas David, Abdelmalek Benkouider, Luc Favre, Antoine Ronda, et al.. Correction: Fabrication of poly-crystalline Si-based Mie resonators via amorphous Si on SiO2 dewetting. Nanoscale, 2016, 8 (14), pp.7768--7768. ⟨10.1039/C6NR90067D⟩. ⟨hal-01811397⟩
152 Consultations
0 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More