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Article Dans Une Revue Solid-State Electronics Année : 2018

Indium-oxide nanoparticles for RRAM devices compatible with CMOS back-end-off-line

Résumé

We report on the fabrication and characterization of Resistive Random Access Memory (RRAM) devices based on nanoparticles in MIM structures. Our approach is based on the use of indium oxide (In2O3) nanoparticles embedded in a dielectric matrix using CMOS-full-compatible fabrication processes in view of back-end-off-line integration for non-volatile memory (NVM) applications. A bipolar switching behavior has been observed using current-voltage measurements (I-V) for all devices. Very high ION/IOFF ratios have been obtained up to 108. Our results provide insights for further integration of In2O3 nanoparticles-based devices for NVM applications.
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Dates et versions

hal-01948065 , version 1 (07-12-2018)

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Citer

Edgar A.A. León Pérez, Pierre-Vincent Guenery, Oumaïma Abouzaid, Khaled Ayadi, Solene Brottet, et al.. Indium-oxide nanoparticles for RRAM devices compatible with CMOS back-end-off-line. Solid-State Electronics, 2018, 143, pp.20-26. ⟨10.1016/j.sse.2017.11.011⟩. ⟨hal-01948065⟩
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