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Article Dans Une Revue Microelectronic Engineering Année : 2018

Nanoimprint stamps with ultra-high resolution: Optimal fabrication techniques

Résumé

Single-digit nanometer patterning by nanoimprint lithography is a challenging task, which requires optimum stamp fabrication technique. In the current work, we present different strategies for technology of hard master stamps to make intermediate working stamps with sub-10 nm features. Methods of both negative and positive master stamps fabrication, based on EBL, RIE and ALD are described and compared. A single-step copying of negative master stamps using a polymer material is a preferred strategy to reach the ultra high-resolution. Lines as small as 5.6 nm are demonstrated in a resist using a combined thermal and UV-imprint with OrmoStamp material as a working stamp.
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Dates et versions

hal-02413897 , version 1 (16-12-2019)

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Mariusz Graczyk, Andrea Cattoni, Benedikt Rösner, Gediminas Seniutinas, Anette Löfstrand, et al.. Nanoimprint stamps with ultra-high resolution: Optimal fabrication techniques. Microelectronic Engineering, 2018, 190, pp.73-78. ⟨10.1016/j.mee.2018.01.008⟩. ⟨hal-02413897⟩
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