Journal Articles
Reactive and Functional Polymers
Year : 2018
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https://cnrs.hal.science/hal-02954615
Submitted on : Thursday, October 1, 2020-11:05:26 AM
Last modification on : Wednesday, December 16, 2020-8:56:05 AM
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- HAL Id : hal-02954615 , version 1
- DOI : 10.1016/j.reactfunctpolym.2018.08.010
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Fang-Cheng Liang, Yi-Hsing Huang, Chi-Ching Kuo, Chia-Jung Cho, Syang-Peng Rwei, et al.. Thermally deposited silk fibroin as the gate dielectric layer in organic thin-film transistors based on conjugated polymer. Reactive and Functional Polymers, 2018, 131, pp.368-377. ⟨10.1016/j.reactfunctpolym.2018.08.010⟩. ⟨hal-02954615⟩
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