%0 Journal Article %T Hybridization of ellipsometry and energy loss spectra from XPS for bandgap and optical constants determination in SiON thin films %+ Laboratoire des technologies de la microélectronique (LTM ) %+ STMicroelectronics [Crolles] (ST-CROLLES) %A Resende, Joao %A Fuard, David %A Le Cunff, Delphine %A Tortai, Jean-Herve %A Pelissier, Bernard %< avec comité de lecture %@ 0254-0584 %J Materials Chemistry and Physics %I Elsevier %V 259 %P 124000 %8 2020-10-30 %D 2020 %R 10.1016/j.matchemphys.2020.124000 %Z Engineering Sciences [physics]Journal articles %X Comparison of bandgap determination using ellipsometry and ELS-XPS. • Large energy bandgap difference between the two methods, up to 1.6 eV. • Combination of the two techniques, using a triple Tauc-Lorentz oscillator model. • Robust determination of the bandgap in the SiO 2-Si 3 N 4 system. • Method to measure n and k in a large energy range, from 1.5 up to 30 eV. %G English %2 https://cnrs.hal.science/hal-03017737/document %2 https://cnrs.hal.science/hal-03017737/file/Manuscript%20-%20SURFCOAT-S-20-03635%20-%20Revision%20Clean.pdf %L hal-03017737 %U https://cnrs.hal.science/hal-03017737 %~ CEA %~ UGA %~ CNRS %~ LTM %~ LITHOGRAPHY %~ DSV %~ CEA-DRF %~ UGA-EPE