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Article Dans Une Revue Journal of Low Temperature Physics Année : 2016

Uniform non-stoichiometric titanium nitride thin films for improved kinetic inductance detector array

Résumé

We describe the fabrication of homogeneous sub-stoichiometric titanium nitride films for microwave kinetic inductance detector (mKID) arrays. Using a 6 inch sputtering target and a homogeneous nitrogen inlet, the variation of the critical temperature over a 2 inch wafer was reduced to <25 %. Measurements of a 132-pixel mKID array from these films reveal a sensitivity of 16 kHz/pW in the 100 GHz band, comparable to the best aluminium mKIDs. We measured a noise equivalent power of NEP = 3.6e-15 Hz/Hz^(1/2). Finally, we describe possible routes to further improve the performance of these TiN mKID arrays.

Dates et versions

in2p3-01213949 , version 1 (09-10-2015)

Identifiants

Citer

G. Coiffard, K-F. Schuster, E. F. C. Driessen, S. Pignard, M. Calvo, et al.. Uniform non-stoichiometric titanium nitride thin films for improved kinetic inductance detector array. Journal of Low Temperature Physics, 2016, 184 (3-4), pp.654-660. ⟨10.1007/s10909-016-1489-9⟩. ⟨in2p3-01213949⟩
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