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In line and ex situ metrology and characterization to enable Area Selective Deposition
C. Vallee
,
M. Bonvalot
,
B. Pelissier
,
J.H. Tortai
,
S. David
et al.
AVS 66th International Symposium 2019, Oct 2019, Colombus (USA), United States
Conference papers
hal-02338893v1
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Enhanced model calibration for e-beam lithography: from pattern selection to parameter optimization
P. Schiavone
,
T. Figueiro
,
M. Saib
,
J.H Tortai
,
K.H Choi
et al.
10th Fraunhofer IISB Lithography Simulation Workshop, Sep 2012, Hersbruck, Germany
Conference papers
hal-00807431v1
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Metrology variability and its impact in process modeling
T. Figueiro
,
M. Saib
,
K.-H. Choi
,
C. Hohle
,
M. J. Thornton
et al.
Journal articles
hal-00936973v1
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Magnetic films of metal-graphene-polymer nanocomposites
H. Takacs
,
B. Viala
,
C. Gourgon
,
F. Duclairoir
,
J.-H. Tortai
et al.
TNT2013, Sep 2013, Seville, Spain
Conference papers
hal-00936979v1
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Line edge roughness characterization with a three dimensional atomic force microscope: Transfer during gate patterning processes
J. Thiault
,
J. Foucher
,
J.H. Tortai
,
O. Joubert
,
S. Landis
et al.
Journal of Vacuum Science and Technology, 2005, pp.B 23 3075-3079
Journal articles
hal-00397051v1
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Epoxy silsesquioxane resists for UV nanoimprint lithography
J. de Girolamo
,
M. Chouiki
,
J.H. Tortai
,
C. Sourd
,
S. Derrough
et al.
Journal of Vacuum Science and Technology, 2008, pp.B 26 2271 (2008)
Journal articles
hal-00387253v1
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Surface characterization of imprinted resist above glass transition temperature
T. Leveder
,
S. Landis
,
L. Davoust
,
S. Soulan
,
J.H. Tortai
et al.
Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), May 2007, Denver, United States
Conference papers
hal-00390373v1
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Non -conductive ferromagnetic carbon-coated (Co, Ni) metal/polystyrene nanocomposites films
H. Takacs
,
B. Viala
,
H. Tortai
,
V. Herman
,
F. Duclairoir
et al.
Journal of Applied Physics, 2016, 119 (9), pp.093907
Journal articles
hal-02025437v1
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Influence of thermal properties of polymers on Nanoimprint lithography performance
C. Perret
,
C. Gourgon
,
G. Micouin
,
J.H. Tortai
,
Jp Grolier
et al.
Jap. J. Appl. Phys., 2002, Vol. 41,, pp.4203-4207
Journal articles
hal-00385720v1
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Diagnostic of the self-healing of metallized polypropylene film by modelling of broadening emission lines of aluminium emitted by plasma discharges
J.H. Tortai
,
N. Bonifaci
,
A. Denat
,
C. Trassy
J. appl phys,, 2005, pp.97, 1 (2005), 053304-1-053304-9
Journal articles
hal-00394483v1
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FEM simulation for artificial generation of SEM pictures
Duy Duc Nguyen
,
Jean-Herve Tortai
,
Patrick Schiavone
Metrology, Inspection, and Process Control for Microlithography XXXIII, Feb 2019, San Jose, United States. pp.1095918, ⟨10.1117/12.2515181⟩
Conference papers
hal-02326619v1
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Modeling of ultra thin resist films structure after spin-coating and post-applied bake
J.H. Tortai
Microelectronic Engineering, 2004, Volumes 73-74, pp.Pages 223-227
Journal articles
hal-00477274v1
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An inverse ellipsometric problem for thin film characterization: Comparison of different optimization methods.
Ayse Akbalik
,
D. Fuard
,
P. Schiavone
,
J.H. Tortai
,
I. Kone
et al.
SPIE 2009, 2009, United States. pp.2009
Conference papers
hal-00385120v1
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Thin film of magnetic nanocomposites with zero effective conductivity for RF applications
H. Takacs
,
B. Viala
,
C. Gourgon
,
F. Duclairoir
,
J.-H. Tortai
et al.
JNTE 2013, May 2013, Evian les bains, France
Conference papers
hal-00936980v1
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Extreme long range process effects characterization and compensation
T. Figueiro
,
C. Browning
,
M. J. Thornton
,
C. Vannuffel
,
K.-H. Choi
et al.
Proc. SPIE 8886, 29th European Mask and Lithography Conference, 2013, pp.88860F. ⟨10.1117/12.2030664⟩
Journal articles
hal-00936969v1
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Exploration of ultimate gate patterning technologies: lithography and plasma etching
J. Thiault
,
J. Foucher
,
J.H. Tortai
,
G. Cunge
,
O. Joubert
et al.
15th International Colloquium on Plasma Processes (CIP), 2005, autrans, France
Conference papers
hal-00398852v1
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Enhanced dielectric properties of epoxy-based photoresist nanocomposites using carbon-coated nickel nanoparticles for high voltage integrated capacitors
M.S. S Alfonso
,
C. Lapeyronie
,
M. Goubet
,
B. Viala
,
J. H. Tortai
et al.
Journal articles
hal-03367966v1
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Core double-shell cobalt/graphene/polystyrene magnetic nanocomposites synthesized by in situ sonochemical polymerization
V. Herman
,
H. Takacs
,
Florence Duclairoir
,
Olivier Renault
,
J. H. Tortai
et al.
Journal articles
hal-01611025v1
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PSF calibration patterns selection based on sensitivity analysis
Thiago Figueiro
,
Mohamed Saib
,
Jean-Herve Tortai
,
Patrick Schiavone
Journal articles
hal-02362305v1
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Advanced module for model parameter extraction using global optimization and sensitivity analysis for electron-beam proximity effect correction
T. Figueiro
,
K.H Choi
,
M.S Gutsch
,
M. Freitag
,
C.K Hohle
et al.
2012 Photomask Technology, 2012, Japan
Conference papers
hal-00807429v1
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Overcoming pattern collapse on e-beam and euv lithography
A. Jouve
,
A. Pikon
,
H. Solak
,
J.H. Tortai
SPIE, 2006, United States. pp.vol 6153, 61531C
Conference papers
hal-00394515v1
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Procédé de correction des effets de proximité électronique utilisant des fonctions de diffusion de type Voigt
J.H Tortai
,
P. Schiavone
,
T. Figueiro
,
N. Jedidi
N° de brevet: 12 53389. 2012
Patents
hal-00807433v1
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Ellipsometry studies of the kinetic of deprotection of thin 193 nm positive tone resist film
H. Ridaoui
,
J.H. Tortai
,
S. Derrough
,
C. Sourd
,
H. Trouve
et al.
Proceeding of SPIE, 2008, pp.vol 6923, 692326-7
Journal articles
hal-00387486v1
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The influence of residual solvent in polymers patterned by NanoImprint Lithography
C. Gourgon
,
C. Perret
,
F. Lazzarino
,
J.H. Tortai
,
G. Micouin
et al.
Nanoimprint and Nanoprint Technology Conference,, 2002, San francisco, United States
Conference papers
hal-00385807v1
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Superior dielectric properties of epoxy-based photoresist thin film nanocomposites with carbon-coated Cu@C nanoparticles
C Lapeyronie
,
M Alfonso
,
B Viala
,
J-H Tortai
Journal articles
hal-03807858v1
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FEM simulation of charging effect during SEM metrology
Duy Duc Nguyen
,
Jean-Herve Tortai
,
Mohamed Abaidi
,
Patrick Schiavone
Conference papers
hal-01942831v1
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New Approach to Closely Spaced Disordered Cobalt-Graphene Polymer Nanocomposites for Non-Conductive RF Ferromagnetic Films
Helene Takacs
,
Bernard Viala
,
V. Herman
,
J. Alarcon Ramos
,
J. H. Tortai
et al.
Journal articles
cea-01745408v1
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Use of optical spacers to enhance infrared Mueller ellipsometry sensitivity: application to the characterization of organic thin films
Gérald Ndong
,
Angel Lizana
,
Enric Garcia-Caurel
,
Valerie Paret
,
Géraldine Melizzi
et al.
Journal articles
hal-01882073v1
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Influence of PEN thermal properties of flexible film patterned by NanoImprint Lithography
C. Gourgon
,
Gilles Philippot
,
S. Labau
,
J.H. Tortai
,
M. Benwadih
et al.
Micro- and Nano-Engineering conference- MNE 2010, 2010, gènes, Italy
Conference papers
hal-00621089v1
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Thickness-dependent glass transition temperature of thin resist films for high resolution lithography
S. Marceau
,
J.H. Tortai
,
J. Tillier
,
N. Vourdas
,
E. Gogolides
et al.
Microelectronic Engineering, 2006, pp.83, 4-9 1073-1077
Journal articles
hal-00394493v1
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