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authIdHal_s : jhtortai

In line and ex situ metrology and characterization to enable Area Selective Deposition

C. Vallee , M. Bonvalot , B. Pelissier , J.H. Tortai , S. David et al.
AVS 66th International Symposium 2019, Oct 2019, Colombus (USA), United States
Conference papers hal-02338893v1

Enhanced model calibration for e-beam lithography: from pattern selection to parameter optimization

P. Schiavone , T. Figueiro , M. Saib , J.H Tortai , K.H Choi et al.
10th Fraunhofer IISB Lithography Simulation Workshop, Sep 2012, Hersbruck, Germany
Conference papers hal-00807431v1

Metrology variability and its impact in process modeling

T. Figueiro , M. Saib , K.-H. Choi , C. Hohle , M. J. Thornton et al.
Proc. SPIE 8880, Photomask Technology 2013, 2013, pp.888020. ⟨10.1117/12.2026423⟩
Journal articles hal-00936973v1

Magnetic films of metal-graphene-polymer nanocomposites

H. Takacs , B. Viala , C. Gourgon , F. Duclairoir , J.-H. Tortai et al.
TNT2013, Sep 2013, Seville, Spain
Conference papers hal-00936979v1

Line edge roughness characterization with a three dimensional atomic force microscope: Transfer during gate patterning processes

J. Thiault , J. Foucher , J.H. Tortai , O. Joubert , S. Landis et al.
Journal of Vacuum Science and Technology, 2005, pp.B 23 3075-3079
Journal articles hal-00397051v1

Epoxy silsesquioxane resists for UV nanoimprint lithography

J. de Girolamo , M. Chouiki , J.H. Tortai , C. Sourd , S. Derrough et al.
Journal of Vacuum Science and Technology, 2008, pp.B 26 2271 (2008)
Journal articles hal-00387253v1

Surface characterization of imprinted resist above glass transition temperature

T. Leveder , S. Landis , L. Davoust , S. Soulan , J.H. Tortai et al.
Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), May 2007, Denver, United States
Conference papers hal-00390373v1

Non -conductive ferromagnetic carbon-coated (Co, Ni) metal/polystyrene nanocomposites films

H. Takacs , B. Viala , H. Tortai , V. Herman , F. Duclairoir et al.
Journal of Applied Physics, 2016, 119 (9), pp.093907
Journal articles hal-02025437v1

Influence of thermal properties of polymers on Nanoimprint lithography performance

C. Perret , C. Gourgon , G. Micouin , J.H. Tortai , Jp Grolier et al.
Jap. J. Appl. Phys., 2002, Vol. 41,, pp.4203-4207
Journal articles hal-00385720v1

Diagnostic of the self-healing of metallized polypropylene film by modelling of broadening emission lines of aluminium emitted by plasma discharges

J.H. Tortai , N. Bonifaci , A. Denat , C. Trassy
J. appl phys,, 2005, pp.97, 1 (2005), 053304-1-053304-9
Journal articles hal-00394483v1

FEM simulation for artificial generation of SEM pictures

Duy Duc Nguyen , Jean-Herve Tortai , Patrick Schiavone
Metrology, Inspection, and Process Control for Microlithography XXXIII, Feb 2019, San Jose, United States. pp.1095918, ⟨10.1117/12.2515181⟩
Conference papers hal-02326619v1

Modeling of ultra thin resist films structure after spin-coating and post-applied bake

J.H. Tortai
Microelectronic Engineering, 2004, Volumes 73-74, pp.Pages 223-227
Journal articles hal-00477274v1

An inverse ellipsometric problem for thin film characterization: Comparison of different optimization methods.

Ayse Akbalik , D. Fuard , P. Schiavone , J.H. Tortai , I. Kone et al.
SPIE 2009, 2009, United States. pp.2009
Conference papers hal-00385120v1

Thin film of magnetic nanocomposites with zero effective conductivity for RF applications

H. Takacs , B. Viala , C. Gourgon , F. Duclairoir , J.-H. Tortai et al.
JNTE 2013, May 2013, Evian les bains, France
Conference papers hal-00936980v1

Extreme long range process effects characterization and compensation

T. Figueiro , C. Browning , M. J. Thornton , C. Vannuffel , K.-H. Choi et al.
Proc. SPIE 8886, 29th European Mask and Lithography Conference, 2013, pp.88860F. ⟨10.1117/12.2030664⟩
Journal articles hal-00936969v1

Exploration of ultimate gate patterning technologies: lithography and plasma etching

J. Thiault , J. Foucher , J.H. Tortai , G. Cunge , O. Joubert et al.
15th International Colloquium on Plasma Processes (CIP), 2005, autrans, France
Conference papers hal-00398852v1
Image document

Enhanced dielectric properties of epoxy-based photoresist nanocomposites using carbon-coated nickel nanoparticles for high voltage integrated capacitors

M.S. S Alfonso , C. Lapeyronie , M. Goubet , B. Viala , J. H. Tortai et al.
Composites Science and Technology, 2021, 216, pp.109063. ⟨10.1016/j.compscitech.2021.109063⟩
Journal articles hal-03367966v1

Core double-shell cobalt/graphene/polystyrene magnetic nanocomposites synthesized by in situ sonochemical polymerization

V. Herman , H. Takacs , Florence Duclairoir , Olivier Renault , J. H. Tortai et al.
RSC Advances, 2015, 5 (63), pp.51371-51381. ⟨10.1039/c5ra06847a⟩
Journal articles hal-01611025v1

PSF calibration patterns selection based on sensitivity analysis

Thiago Figueiro , Mohamed Saib , Jean-Herve Tortai , Patrick Schiavone
Microelectronic Engineering, 2013, 112, pp.282-286. ⟨10.1016/j.mee.2013.03.113⟩
Journal articles hal-02362305v1

Advanced module for model parameter extraction using global optimization and sensitivity analysis for electron-beam proximity effect correction

T. Figueiro , K.H Choi , M.S Gutsch , M. Freitag , C.K Hohle et al.
2012 Photomask Technology, 2012, Japan
Conference papers hal-00807429v1

Overcoming pattern collapse on e-beam and euv lithography

A. Jouve , A. Pikon , H. Solak , J.H. Tortai
SPIE, 2006, United States. pp.vol 6153, 61531C
Conference papers hal-00394515v1

Procédé de correction des effets de proximité électronique utilisant des fonctions de diffusion de type Voigt

J.H Tortai , P. Schiavone , T. Figueiro , N. Jedidi
N° de brevet: 12 53389. 2012
Patents hal-00807433v1

Ellipsometry studies of the kinetic of deprotection of thin 193 nm positive tone resist film

H. Ridaoui , J.H. Tortai , S. Derrough , C. Sourd , H. Trouve et al.
Proceeding of SPIE, 2008, pp.vol 6923, 692326-7
Journal articles hal-00387486v1

The influence of residual solvent in polymers patterned by NanoImprint Lithography

C. Gourgon , C. Perret , F. Lazzarino , J.H. Tortai , G. Micouin et al.
Nanoimprint and Nanoprint Technology Conference,, 2002, San francisco, United States
Conference papers hal-00385807v1
Image document

Superior dielectric properties of epoxy-based photoresist thin film nanocomposites with carbon-coated Cu@C nanoparticles

C Lapeyronie , M Alfonso , B Viala , J-H Tortai
Materials Research Express, 2022, 9 (10), pp.106301. ⟨10.1088/2053-1591/ac9574⟩
Journal articles hal-03807858v1

FEM simulation of charging effect during SEM metrology

Duy Duc Nguyen , Jean-Herve Tortai , Mohamed Abaidi , Patrick Schiavone
34th European Mask and Lithography Conference, Jun 2018, Grenoble, France. ⟨10.1117/12.2326609⟩
Conference papers hal-01942831v1

New Approach to Closely Spaced Disordered Cobalt-Graphene Polymer Nanocomposites for Non-Conductive RF Ferromagnetic Films

Helene Takacs , Bernard Viala , V. Herman , J. Alarcon Ramos , J. H. Tortai et al.
IEEE Transactions on Magnetics, 2015, 51, pp.2802304. ⟨10.1109/tmag.2015.2445824⟩
Journal articles cea-01745408v1

Use of optical spacers to enhance infrared Mueller ellipsometry sensitivity: application to the characterization of organic thin films

Gérald Ndong , Angel Lizana , Enric Garcia-Caurel , Valerie Paret , Géraldine Melizzi et al.
Applied optics, 2016, 55 (12), pp.436 - 439. ⟨10.1364/AO.55.003323⟩
Journal articles hal-01882073v1

Influence of PEN thermal properties of flexible film patterned by NanoImprint Lithography

C. Gourgon , Gilles Philippot , S. Labau , J.H. Tortai , M. Benwadih et al.
Micro- and Nano-Engineering conference- MNE 2010, 2010, gènes, Italy
Conference papers hal-00621089v1

Thickness-dependent glass transition temperature of thin resist films for high resolution lithography

S. Marceau , J.H. Tortai , J. Tillier , N. Vourdas , E. Gogolides et al.
Microelectronic Engineering, 2006, pp.83, 4-9 1073-1077
Journal articles hal-00394493v1