Solvothermal Vapor Annealing of Lamellar Poly(styrene)- block -poly( d , l -lactide) Block Copolymer Thin Films for Directed Self-Assembly Application - CNRS - Centre national de la recherche scientifique Accéder directement au contenu
Article Dans Une Revue ACS Applied Materials & Interfaces Année : 2016

Solvothermal Vapor Annealing of Lamellar Poly(styrene)- block -poly( d , l -lactide) Block Copolymer Thin Films for Directed Self-Assembly Application

Résumé

Solvo-thermal vapor annealing (STVA) was employed to induce microphase separation in a lamellar forming semicrystalline block copolymer (BCP) thin film containing a rapidly degradable block. Directed self-assembly of poly(styrene)-block-poly(D,L-lactide) (PS-b-PLA) BCP films via topographically patterned silicon nitride was demonstrated with alignment over macroscopic areas. Interestingly, we observed lamellar patterns aligned parallel as well as perpendicular to graphoepitaxial guiding patterns . PS-b-PLA BCP microphase separated with high a degree of order in an atmosphere of tetrahydrofuran (THF) with an elevated vapor pressure (at ca. 40-60°C). Grazing incidence small angle X-ray scattering (GISAXS) measurements of PS-b-PLA films reveals the through-film uniformity of perpendicular domains after STVA. Perpendicular lamellar orientation was observed on both hydrophilic and relatively hydrophobic surfaces with a periodicity (L0) of ~ 32.5 nm. The rapid removal of the PLA domains is demonstrated using a mild basic solution for the development of a well-defined PS mask template. GISAXS data reveals the through-film uniformity is retained following wet etching. The experimental results in this article demonstrate highly oriented PS-b-PLA microdomains after a short annealing period and facile PLA removal forming porous on-chip etch masks for nanolithography application.
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hal-03614806 , version 1 (19-08-2022)

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Cian Cummins, Parvaneh Mokarian-Tabari, Pascal Andreazza, Christophe Sinturel, Michael Morris. Solvothermal Vapor Annealing of Lamellar Poly(styrene)- block -poly( d , l -lactide) Block Copolymer Thin Films for Directed Self-Assembly Application. ACS Applied Materials & Interfaces, 2016, 8 (12), pp.8295-8304. ⟨10.1021/acsami.6b00765⟩. ⟨hal-03614806⟩
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