Measurement of minority carrier diffusion length in p -GaN using electron emission spectroscopy (EES)
Résumé
Electron emission spectroscopy was performed on metalorganic chemical vapor deposition grown p-n−-n+ junctions with p-thicknesses ranging from 50 to 300 nm, doped with [Mg] = 3.5 × 1019 cm−3. By measuring the decreasing emitted electron intensity from a cesiated p-GaN surface with increasing p-thickness, we were able to extract the minority carrier diffusion length of electron in p-type GaN, Le = 26 ± 3 nm. The measured value is in good agreement with literature reported values. The extrapolated electron current at the n− region–p-GaN interface is in reasonable agreement with the simulated electron current at the interface.
Domaines
Physique [physics]| Origine | Fichiers produits par l'(les) auteur(s) |
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