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Communication Dans Un Congrès Année : 2021

Study of buried interfaces in Fe/Si multilayer by hard x-ray emission spectroscopy

Résumé

The study of periodic multilayers is a topic of interest due to their applicability as optical components for numerous applications in x-ray mirrors, x-ray spectroscopy, space telescopes, and quantum well lasers. The optical performance of these multilayers dramatically depends on the interfaces formed between different layers of the multilayer stack. Hence, it is essential to characterize them and obtain necessary information regarding the multilayer structure. X-ray emission spectroscopy (XES) has been proved to be a studied tool for analyzing buried layers and interfaces non-destructively. The emission spectra allow us to study the interactions between elements in the buried layers from the analysis of their valence states, thereby providing sensitive information about the ph ysical-chemical environment of the emitting element in multilayers. Until now, XES has been applied in the soft x-ray region (photon energy ≤ 2 keV) to study the buried layers and interfaces, but now we extend the methodology to study the buried interfaces in the hard x-ray region (i.e., ≥ 5 keV). We choose Fe/Si multilayer system owing to its potential applications in microelectronics and magnetism. We exploit the chemical sensitivity of XES to study the interfaces between Fe and Si layers in the Fe/Si multilayer from the Fe Kβ2,5 emission spectra obtained in the hard x-ray region. The Fe Kβ5 emission line results from the electronic transition from occupied 3d to 1s levels (i.e., valence to core transition) and is hence sensitive to the chemical state of emitting Fe atoms. The characterization of the physicochemical state of the iron atoms within the Fe/Si multilayer as obtained by XES shows the formation of iron silicide, i.e., FeSi2 at the interface and enabled the determination of its thickness of 1.2 nm. The formation of FeSi2 at the interface was further confirmed by the x-ray diffraction and X-ray photoelectron spectroscopy done on the Fe/Si multilayer.
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Dates et versions

hal-03932835 , version 1 (01-02-2023)

Identifiants

  • HAL Id : hal-03932835 , version 1

Citer

Hina Verma, Karine Le Guen, Renaud Delaunay, Iyas Ismail, V. Ilakovac, et al.. Study of buried interfaces in Fe/Si multilayer by hard x-ray emission spectroscopy. ICISM 2021, Int. Conf. on Interfaces, Surfaces and Materials, May 2021, Berlin, Germany. ⟨hal-03932835⟩
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