Thulium and Ytterbium-Doped Titanium Oxide Thin Films Deposited by Ultrasonic Spray Pyrolysis - CNRS - Centre national de la recherche scientifique Accéder directement au contenu
Article Dans Une Revue Journal of Thermal Spray Technology Année : 2012

Thulium and Ytterbium-Doped Titanium Oxide Thin Films Deposited by Ultrasonic Spray Pyrolysis

Résumé

Thin films of thulium and ytterbium-doped titanium oxide were grown by metal-organic spray pyrolysis deposition from titanium(IV)oxide bis(acetylacetonate), thulium(III) tris(2,2,6,6-tetramethyl-3,5-heptanedionate) and ytterbium(III) tris(acetylacetonate). Deposition temperatures have been investigated from 300 to 600 A degrees C. Films have been studied regarding their crystallinity and doping quality. Structural and composition characterisations of TiO2:Tm,Yb were performed by electron microprobe, x-ray diffraction, and Fourier transform infrared spectroscopy. The deposition rate can reach 0.8 mu m/h. The anatase phase of TiO2 was obtained after synthesis at 400 A degrees C or higher. Organic contamination at low deposition temperature is eliminated by annealing treatments.

Domaines

Matériaux

Dates et versions

hal-01067597 , version 1 (23-09-2014)

Identifiants

Citer

Sébastien Forissier, Hervé Roussel, Patrick Chaudouet, Antonio Pereira, Jean-Luc Deschanvres, et al.. Thulium and Ytterbium-Doped Titanium Oxide Thin Films Deposited by Ultrasonic Spray Pyrolysis. Journal of Thermal Spray Technology, 2012, 21 (6), pp.1263-1268. ⟨10.1007/s11666-012-9813-7⟩. ⟨hal-01067597⟩
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