Poster De Conférence Année : 2025

Metrology of low absorption and photo-induced effects at 1.1 and 1.5 μm with Lock-in Thermography and phase imaging techniques

Résumé

This study quantifies absorption and wavefront deformations in optical thin films using Lock-in Thermography (LIT) and phase imaging techniques. A finite element model simulates thermo-mechanical effects, providing insights to optimize high-power laser system performance and reliability.

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Dates et versions

hal-05521302 , version 1 (20-02-2026)

Identifiants

Citer

Mathias Soulier, Hélène Krol, Julien Lumeau, Laurent Gallais. Metrology of low absorption and photo-induced effects at 1.1 and 1.5 μm with Lock-in Thermography and phase imaging techniques. Optical Interference Coatings, 2025, Tucson, United States. Optica Publishing Group, pp.WD.3, ⟨10.1364/OIC.2025.WD.3⟩. ⟨hal-05521302⟩
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